Recrystallization of thin amorphous silicon (a-Si) films can yield polysilicon (p-Si) material with functional properties suitable for fabrication of electronic devices, including high definition large area active matrix liquid crystal displays. Pulsed laser-effected melting and recrystallization is exceptionally effective since it avoids damage to the underlying insulator structure. The ensuing phase transformations and ultimately the quality of the produced p-Si material strongly depend on the temperature history. This article presents a review of research aiming to understand the complex nucleation, resolidification and crystal growth phenomena that evolve under severely non-equilibrium conditions. It is shown that elucidation of the fundamental thermodynamic processes enables conception of novel practical thin film crystal growth techniques.
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Review Papers
Heat Transfer and Phase Transformations in Laser Annealing of Thin Si Films
Seung-Jae Moon,
Seung-Jae Moon
Department of Mechanical Engineering, Laser Thermal Laboratory, University of California, Berkeley, CA 94720-1740
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Minghong Lee,
Minghong Lee
Department of Mechanical Engineering, Laser Thermal Laboratory, University of California, Berkeley, CA 94720-1740
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Costas P. Grigoropoulos
e-mail: cgrigoro@me.berkeley.edu
Costas P. Grigoropoulos
Department of Mechanical Engineering, Laser Thermal Laboratory, University of California, Berkeley, CA 94720-1740
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Seung-Jae Moon
Department of Mechanical Engineering, Laser Thermal Laboratory, University of California, Berkeley, CA 94720-1740
Minghong Lee
Department of Mechanical Engineering, Laser Thermal Laboratory, University of California, Berkeley, CA 94720-1740
Costas P. Grigoropoulos
Department of Mechanical Engineering, Laser Thermal Laboratory, University of California, Berkeley, CA 94720-1740
e-mail: cgrigoro@me.berkeley.edu
Contributed by the Heat Transfer Division for publication in the JOURNAL OF HEAT TRANSFER. Manuscript received by the Heat Transfer Division October 10, 2001; revision received November 5, 2001. Editor: V. Dhir.
J. Heat Transfer. Apr 2002, 124(2): 253-264 (12 pages)
Published Online: November 5, 2001
Article history
Received:
October 10, 2001
Revised:
November 5, 2001
Citation
Moon , S., Lee , M., and Grigoropoulos, C. P. (November 5, 2001). "Heat Transfer and Phase Transformations in Laser Annealing of Thin Si Films ." ASME. J. Heat Transfer. April 2002; 124(2): 253–264. https://doi.org/10.1115/1.1447941
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